Title :
A Novel Model for Surface Evolvement and Footing Effect Simulations in DRIE Fabrications
Author :
Jian Zhang ; Qing-An Huang
Author_Institution :
Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing
Abstract :
A novel model for surface evolvement and footing effect simulations in ICP DRIE fabrications is reported, which is based on time multiplexed deep etching (TMDE). It couples the advanced plasma sheath approximation and has the simplex data structure due to 2-D string algorithm. Furthermore, the model has the ability to simulate the footing effect if some reasonable descriptions for footing surface are assumed. The simulation results are in agreement with the experiments.
Keywords :
micromechanical devices; plasma sheaths; sputter etching; 2D string algorithm; ICP DRIE fabrication; MEMS fabrication; NEMS fabrication; advanced plasma sheath approximation; deep reactive ion etching; footing effect simulation; inductively coupled plasma etching; surface evolvement; time multiplexed deep etching; Approximation algorithms; Etching; Fabrication; Micromechanical devices; Nanoelectromechanical systems; Plasma applications; Plasma sheaths; Plasma temperature; Plasma transport processes; Silicon on insulator technology; DRIE; footing effect; model; surface evolvement;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
Conference_Location :
Zhuhai
Print_ISBN :
1-4244-0139-9
Electronic_ISBN :
1-4244-0140-2
DOI :
10.1109/NEMS.2006.334892
