The study on controlling the density of Carbon nanotube film

Author

Li, Xin ; Liu, Junhua ; Zhu, Changchun

Author_Institution

Sch. of Electron. & Inf. Eng., Xi´´an Jiaotong Univ., Xi´´an

fYear

2006

fDate

18-21 Jan. 2006

Firstpage

797

Lastpage

800

Abstract

The carbon nanotube film is grown by low press chemical vapor deposit (LPCVD) method after catalyst grains are introduced with ferro hydroxid sol. The variation of the concentration of catalyst grains versus the surface morphology of carbon nanotube film has been studied. When the distance between two nanotubes is from 200 nm to 500 nm, the threshold electric voltage is around 95 V for the best result in experiment. The electric field and the emission current of the top of carbon nanotube array have been computed using finite element analysis (software ANSYS 8.0), the results are matched with the experiment.

Keywords

carbon nanotubes; chemical vapour deposition; electronic engineering computing; finite element analysis; sols; surface morphology; ANSYS 8.0; carbon nanotube film; ferro hydroxid sol; finite element analysis; low press chemical vapor deposit method; surface morphology; Arc discharges; Carbon nanotubes; Cathodes; Chemical technology; Chemical vapor deposition; Costs; Impurities; Surface morphology; Systems engineering and theory; Threshold voltage; carbon nanotube; element analysis; field emission; sol;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on

Conference_Location

Zhuhai

Print_ISBN

1-4244-0139-9

Electronic_ISBN

1-4244-0140-2

Type

conf

DOI

10.1109/NEMS.2006.334898

Filename

4135071