The Fabrication of Nano Structures on Wafer Surface by using Nano Island Lithography

There are serial structuring methods invented or used for the fabrication of nano structures. However, there is an urgent need for innovative processing technologies, including hybrid methods across multiple energetic domains, and three-dimensional imaging and fabrication technologies such as ultrasonics. This paper shows a novel method of nano island lithography to shape hemispherically islands of cesium chloride with nano size. Nano island lithography was invented by Prof. Mino Green in Imperial College as a synthetic fabricating method (bottom-up). The method is the exposure of the CsCl thin film to water vapor for growth of CsCl islands (also called dots or hemispheres). Growth rate of CsCl islands is dominated by the kinetics of dissolution and deposition at the solid/solution boundary, rather than by inter island diffusion. The CsCl islands are translated to wafer or other material surface by RIE and lift-off technologies which are transformative (top-down) fabrication. And more, the island lithography can combine with UV lithography to create micro and nano scale hierarchical structures which induce super-hydrophobic surfaces with large CA and small alpha.