Batch Fabrication of Self-assembled Nickel-Iron Nanowires by Electrodeposition

Lack of batch-compatible fabrication techniques can be considered as the most important challenge in the integration of nanostructures with microelectromechanical systems (MEMS). A solution to the micro-nano integration problem is offered by introducing a batch-compatible nanowire fabrication technique based on basic lithographic techniques and guided self-assembly. The basic principle is obtaining cracks at predetermined locations in a sacrificial SiO₂ layer on Si and filling these cracks with a suitable metal by electrodeposition. The technique is demonstrated by using nickel-iron as the deposition material and verifying the magnetic behavior of resulting nanowires