• DocumentCode
    2058301
  • Title

    Fabrication characteristics of 1.2kV SiC JBS diode

  • Author

    Kim, Sang-Cheol ; Bahng, Wook ; Kang, In-Ho ; Joo, Sung-Jae ; Kim, Nam-Kyun

  • Author_Institution
    Integrated Power Supply Res. Group, Korea Electrotechnol. Res. Inst., Changwon
  • fYear
    2008
  • fDate
    11-14 May 2008
  • Firstpage
    181
  • Lastpage
    184
  • Abstract
    The design, process, and the DC and switching characterization of 4H-SiC junction barrier Schottky (JBS) diode from room temperature up to 200degC have been presented. We used a p-type, slightly deep inner ring and a simple p-type stripe in the Schottky region, and used a field limiting ring (FLR) having variable space and width for an edge termination. The fabrication process was also optimized. The JBS diode having Schottky area of 9.8 x 10-3 cm2, and having the space and width of 3 mum for FLR and ring showed the blocking voltage of 1.2 kV at reverse leakage current of 50 uA and the forward current density of 300 A/cm at 3A. We also investigated the operation of SiC JBS diode at temperature up to 200degC. Forward on-state voltage characteristics is 1.8 V(@1A) at room temperature, however, it is slightly increased to 2.4 V(@1A) at 200degC. The recovery characteristics of the fabricated JBS was 7.6 ns at room temperature. This result was much superior to that of Si-FRD.
  • Keywords
    Schottky barriers; Schottky diodes; 4H-SiC junction barrier Schottky diode design; DC characterization; current 1 A; current 3 A; edge termination; fabrication characteristics; field limiting ring; p-type stripe; switching characterization; temperature 200 C; time 7.6 ns; voltage 1.2 kV; voltage 1.8 V; voltage 2.4 V; Aluminum; Annealing; Boron; Fabrication; Leakage current; Schottky diodes; Silicon carbide; Solid modeling; Temperature; Voltage; 4H-SiC; High temperature; JBS; Switching characteristics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 2008. MIEL 2008. 26th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    978-1-4244-1881-7
  • Electronic_ISBN
    978-1-4244-1882-4
  • Type

    conf

  • DOI
    10.1109/ICMEL.2008.4559253
  • Filename
    4559253