DocumentCode :
2059033
Title :
Pentacene - SiO2 interface: Role of the environment prior to pentacene deposition and its impact on TFT DC characteristics
Author :
Cvetkovic, N.V. ; Tsamados, D. ; Sidler, K. ; Brugger, J. ; Ionescu, A.M.
Author_Institution :
Ecole Polytech. Fed. de Lausanne, Lausanne
fYear :
2008
fDate :
11-14 May 2008
Firstpage :
295
Lastpage :
297
Abstract :
In this paper we report on the effect of the environment on the SiO2/pentacene interface. Two batches of bottom-contact pentacene thin-film transistors have been fabricated with a 100 nm thick SiO2 as dielectric. Considerable shifts of the threshold voltages have been observed for the TFTs whose dielectric surface has been exposed to air for long periods of storage before depositing the pentacene layer. Based on reports from other research groups in the field, we consider that long exposure of the SiO2 to air may have the same effect on the SiO2-pentace interface as short but more aggressive oxygen plasma treatment.
Keywords :
interface structure; organic compounds; silicon compounds; thin film transistors; Jk-SiO2; bottom-contact pentacene thin-film transistors; dielectric surface; oxygen plasma treatment; size 100 nm; threshold voltages; Dielectrics; Gold; Microelectronics; Organic thin film transistors; Pentacene; Plasma devices; Plasma temperature; Surface treatment; Thin film transistors; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location :
Nis
Print_ISBN :
978-1-4244-1881-7
Electronic_ISBN :
978-1-4244-1882-4
Type :
conf
DOI :
10.1109/ICMEL.2008.4559282
Filename :
4559282
Link To Document :
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