• DocumentCode
    2059033
  • Title

    Pentacene - SiO2 interface: Role of the environment prior to pentacene deposition and its impact on TFT DC characteristics

  • Author

    Cvetkovic, N.V. ; Tsamados, D. ; Sidler, K. ; Brugger, J. ; Ionescu, A.M.

  • Author_Institution
    Ecole Polytech. Fed. de Lausanne, Lausanne
  • fYear
    2008
  • fDate
    11-14 May 2008
  • Firstpage
    295
  • Lastpage
    297
  • Abstract
    In this paper we report on the effect of the environment on the SiO2/pentacene interface. Two batches of bottom-contact pentacene thin-film transistors have been fabricated with a 100 nm thick SiO2 as dielectric. Considerable shifts of the threshold voltages have been observed for the TFTs whose dielectric surface has been exposed to air for long periods of storage before depositing the pentacene layer. Based on reports from other research groups in the field, we consider that long exposure of the SiO2 to air may have the same effect on the SiO2-pentace interface as short but more aggressive oxygen plasma treatment.
  • Keywords
    interface structure; organic compounds; silicon compounds; thin film transistors; Jk-SiO2; bottom-contact pentacene thin-film transistors; dielectric surface; oxygen plasma treatment; size 100 nm; threshold voltages; Dielectrics; Gold; Microelectronics; Organic thin film transistors; Pentacene; Plasma devices; Plasma temperature; Surface treatment; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 2008. MIEL 2008. 26th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    978-1-4244-1881-7
  • Electronic_ISBN
    978-1-4244-1882-4
  • Type

    conf

  • DOI
    10.1109/ICMEL.2008.4559282
  • Filename
    4559282