Title :
Subwavelength nanolithography using surface plasmons
Author :
Srituravanich, W. ; Fang, N. ; Sun, C. ; Luo, Q. ; Zhang, X.
Author_Institution :
Dept. of Mech. & Aerosp. Eng., California Univ., Los Angeles, CA, USA
Abstract :
We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through a plasmonic mask, which is an opaque metal film with subwavelength hole arrays in it. The hole arrays of various diameters are fabricated by using focused ion beam (FIB). Through the lithography, the hole array patterns are transferred to negative photoresists. As a result, high contrast dot arrays with the smallest diameter of 120 nm, equivalent to ∼λ/3, are observed by atomic force microscope (AFM).
Keywords :
aluminium; atomic force microscopy; focused ion beam technology; masks; metallic thin films; nanolithography; photoresists; quartz; surface plasmons; 120 nm; AFM; Al-SiO2; atomic force microscopy; dot arrays; focused ion beam; negative photoresists; opaque metal film; photoresist layer; plasmonic mask; plasmonic nanolithography; subwavelength hole arrays; subwavelength nanolithography; surface plasmons; Aluminum; Apertures; Dielectric materials; Lithography; Nanolithography; Optical surface waves; Plasmons; Resists; Surface treatment; Surface waves;
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
DOI :
10.1109/NANO.2003.1230985
