DocumentCode :
2059109
Title :
Ultraviolet-photon-induced paramagnetic centers in Ge and Sn co-doped silica glass
Author :
Fujimaki, Makoto ; Tokuhiro, Shin-Ichiro ; Nakanishi, Tetsuya ; Nomura, Ken-ichi ; Ohki, Yoshimichi ; Imamura, Kazuo
fYear :
2001
fDate :
2001
Firstpage :
665
Lastpage :
668
Abstract :
We have examined paramagnetic centers and absorption bands in the visible-to-uv region in Ge and Sn co-doped SiO2 glass irradiated with UV photons from a KrF excimer laser. The generation mechanisms, optical properties, and roles in the photo-induced refractive index change of the paramagnetic centers are discussed
Keywords :
germanium; glass; impurity absorption spectra; paramagnetic resonance; refractive index; silicon compounds; tin; ultraviolet radiation effects; ultraviolet spectra; visible spectra; KrF excimer laser; SiO2:Ge,Sn; co-doped silica glass; optical properties; paramagnetic centers; refractive index; ultraviolet photon irradiation; visible-to-UV absorption bands; Computer industry; Electromagnetic wave absorption; Electrons; Glass; Optical pulses; Paramagnetic materials; Paramagnetic resonance; Refractive index; Silicon compounds; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulating Materials, 2001. (ISEIM 2001). Proceedings of 2001 International Symposium on
Conference_Location :
Himeji
Print_ISBN :
4-88686-053-2
Type :
conf
DOI :
10.1109/ISEIM.2001.973763
Filename :
973763
Link To Document :
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