Title :
Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
Author :
Jovic, V. ; Lamovec, J. ; Popovic, M.
Author_Institution :
Dept. of Microelectron. Technol. & Single Crystals, Belgrade Univ., Belgrade
Abstract :
Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si (100). For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Keywords :
additives; etching; surface topography; Si; alkaline solutions; propanol isomers additives; silicon anisotropic etching; surface topography; Anisotropic magnetoresistance; Chemicals; Dry etching; Fabrication; Microelectronics; Micromachining; Silicon; Surface contamination; Surface topography; Wet etching;
Conference_Titel :
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location :
Nis
Print_ISBN :
978-1-4244-1881-7
Electronic_ISBN :
978-1-4244-1882-4
DOI :
10.1109/ICMEL.2008.4559295
