Title :
The Influence of Support Structure Pattern to the Flatness of Reflector Moving Grating Light Modulator
Author :
Jie, Zhang ; Shanglian, Huang ; Xu, Yan ; Lei, Han ; Yi, Wu ; Zhihai, Zhang
Author_Institution :
Key Lab. of Optoelectron. Technol. & Syst., Chongqing Univ.
Abstract :
To improve the operating efficiency, a novel optical light modulator, called reflector moving grating light modulator (RMGLM), is presented. It consists of a fixed grating plate, address electrode, support structure, and a movable reflector, piston-type motion of the reflector can be used to modulate the phase of incident light. The RMGLM optical performance is theoretically analyzed with Fourier optics. The flatness of movable reflector which is influenced by support structure pattern, is extraordinary important. To gain optimized flatness, several support structure patterns are presented and compared. The mechanic models of all structures are analyzed. Meanwhile, simulations of the movable reflector surface shape using CoventorWare are carried on. The influence of different parameter for each support structure pattern model is given by data and figures. With optimal characteristic dimension based on homologous aerofoil configuration support structure pattern, the flatness can be higher than 98%, which is available for RMGLM operation
Keywords :
Fourier transform optics; diffraction gratings; micro-optomechanical devices; optical modulation; phase modulation; CoventorWare; Fourier optics; address electrode; aerofoil; flatness; reflector moving grating light modulator; support structure pattern; Diffraction gratings; Displays; Electrodes; Electrostatics; Intensity modulation; Optical devices; Optical diffraction; Optical modulation; Optical surface waves; Performance analysis;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
Conference_Location :
Zhuhai
Print_ISBN :
1-4244-0139-9
Electronic_ISBN :
1-4244-0140-2
DOI :
10.1109/NEMS.2006.334746
