Spatial Distribution Measurement of Dynamic Voltage Drop Caused by Pulse and Periodic Injection of Spot Noise

This paper presents measured results of dynamic voltage drop caused by pulse and periodic injection of spot noise. The test structure being fabricated by a 45 nm low-power process has 1024 delay probes to measure spatial distributions in response to the spot-noise generation. The test structure is the advanced version of our predecessor being fabricated by a 65-nm node, and can trace changes in the spatial distributions with time after the noise injection. The measured results are compared with SPICE simulations, in which package/socket LCR as well as power-line RC within the die is modeled. It is found that the simple model agrees well with the measured results.