Demonstration of nano-structures using wedge-molding process

A technique for nano-pattern generation and transfer, called "wedge molding" process is demonstrated. The technique utilizes anisotropic wet-chemical etching of crystalline InP or silicon wafer to obtain ultra-smooth V-grooves with nano-scale features (such as lines and dots) to create molds for a nano-imprinting process. High fidelity polymer materials, such as PDMS and Epoxy, were chosen to replicate the nano-features of groove bottoms. The technique has advantages of low cost, easy fabrication, high throughput, and high fidelity in generating nano-scale features such as wires and dots. Preliminary results indicate anisotropic wet-chemical etching could achieve smaller than 30 nm lateral size at the bottom of etched groove. High fidelity PDMS molds and epoxy molds can be replicated from the etched V-groove. AFM results demonstrated that around 100 nm wide line pattern could be transferred to nitride wafer with controlled RIE process.