A Design of Alignment System for Overlaying in Scanning Probe Lithographic Technology and Analyses of Alignment Precision

As the optical alignment system for lithography cannot be compatible with the equipment and the manufacturing process in nanofabrication with scanning probe microscope, new precision alignment methods are required. In this paper, we investigated ultra-precision alignment system especially to the overlay in SPL technology and completed the fabrication of two-layer graphics by AFM oxidation. On the basis of the alignment arithmetic of optical lithography and the characteristics of AFM oxidation, we provided the high resolution and high contrast markers which were fabricated by AFM oxidation, as well as the analyses of the alignment precision, especially of the alignment repeatability and the overlaying accuracy. The precision was detected by a group of verniers which were fabricated by AFM oxidation