• DocumentCode
    2060346
  • Title

    Fabrication of Hexagonal-Prism Microstructure using Monolithic Etching Process

  • Author

    Yang, Hsiharng ; Li, Fang-Yaung ; Chein, Reiyu

  • Author_Institution
    Graduate Inst. of Precision Eng., Nat. Chung Hsing Univ., Taichung
  • fYear
    2006
  • fDate
    18-21 Jan. 2006
  • Firstpage
    1474
  • Lastpage
    1478
  • Abstract
    In this paper, we propose a novel method to fabricate three-dimensional hexagonal-like fillister structures on lang110rang silicon wafer by precise bulk etching in micro electro mechanical systems (MEMS). Photo mask is designed as a 50 times 50 array of equilateral parallelograms having side length of 80 mum. The 40 wt% KOH solution is used as the etchant. The created structure is used as the mold to cast the PDMS three-dimensional hexagonal-like structures. The created microstructure is believed to have great potential in developing high performance devices in optical, heat-exchanging, and biochemical applications
  • Keywords
    etching; micromechanical devices; polymers; potassium compounds; silicon; 3D hexagonal-like fillister structures; 80 micron; KOH; PDMS; biochemical applications; heat-exchanging applications; hexagonal-prism microstructure; microelectromechanical systems; monolithic etching process; optical applications; photomask; polydimethylsiloxane; precise bulk etching; silicon wafer; Anisotropic magnetoresistance; Crystallography; Fabrication; Micromechanical devices; Microstructure; Optical devices; Rough surfaces; Silicon devices; Surface roughness; Wet etching; <110> wafer; Bulk etching; Hexagonal-like structure; MEMS;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
  • Conference_Location
    Zhuhai
  • Print_ISBN
    1-4244-0139-9
  • Electronic_ISBN
    1-4244-0140-2
  • Type

    conf

  • DOI
    10.1109/NEMS.2006.334810
  • Filename
    4135222