DocumentCode
2060346
Title
Fabrication of Hexagonal-Prism Microstructure using Monolithic Etching Process
Author
Yang, Hsiharng ; Li, Fang-Yaung ; Chein, Reiyu
Author_Institution
Graduate Inst. of Precision Eng., Nat. Chung Hsing Univ., Taichung
fYear
2006
fDate
18-21 Jan. 2006
Firstpage
1474
Lastpage
1478
Abstract
In this paper, we propose a novel method to fabricate three-dimensional hexagonal-like fillister structures on lang110rang silicon wafer by precise bulk etching in micro electro mechanical systems (MEMS). Photo mask is designed as a 50 times 50 array of equilateral parallelograms having side length of 80 mum. The 40 wt% KOH solution is used as the etchant. The created structure is used as the mold to cast the PDMS three-dimensional hexagonal-like structures. The created microstructure is believed to have great potential in developing high performance devices in optical, heat-exchanging, and biochemical applications
Keywords
etching; micromechanical devices; polymers; potassium compounds; silicon; 3D hexagonal-like fillister structures; 80 micron; KOH; PDMS; biochemical applications; heat-exchanging applications; hexagonal-prism microstructure; microelectromechanical systems; monolithic etching process; optical applications; photomask; polydimethylsiloxane; precise bulk etching; silicon wafer; Anisotropic magnetoresistance; Crystallography; Fabrication; Micromechanical devices; Microstructure; Optical devices; Rough surfaces; Silicon devices; Surface roughness; Wet etching; <110> wafer; Bulk etching; Hexagonal-like structure; MEMS;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
Conference_Location
Zhuhai
Print_ISBN
1-4244-0139-9
Electronic_ISBN
1-4244-0140-2
Type
conf
DOI
10.1109/NEMS.2006.334810
Filename
4135222
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