Electron-beam-induced deposition of conductive nanostructures with carbon nanotube emitters

Author

Arai, Fumihito ; Liu, Pou ; Dong, Lixin ; Nakajima, Masahiro ; Fukuda, Toshio

Author_Institution

Dept. of Micro Syst. Eng., Nagoya Univ., Japan

Volume

2

fYear

2003

fDate

12-14 Aug. 2003

Firstpage

811

Abstract

Electron-beam-induced deposition (EBID) with two kinds of organometallic compounds including tungsten hexacarbonyle (W(CO)₆) and dimethyl-gold ((CH₃)₂(C₅H₇O₂)Au) as precursors is presented so as to obtain conductive nanostructures. Their resistivity and growth rate are measured, and the composition of deposits are analyzed. To improve the resolution of the deposit and energy consumption, EBID with multiwalled carbon nanotubes (MWNTs) as emitters is demonstrated. In the deposit at anode by using W(CO)₆, mass of the tungsten reaches up to 80% among the compositions.

Keywords

carbon nanotubes; electrical resistivity; electron beam deposition; organometallic compounds; thin films; C; MWNT; conductive nanostructures; dimethyl gold; electron beam induced deposition; energy consumption; growth rate; multiwalled carbon nanotubes emitters; organometallic compounds; resistivity; tungsten hexacarbonyle W(CO)₆; Carbon dioxide; Carbon nanotubes; Conductivity; Electron tubes; Glass; Heating; Nanostructures; Systems engineering and theory; Temperature; Tungsten;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on

Print_ISBN

0-7803-7976-4

Type

conf

DOI

10.1109/NANO.2003.1231038

Filename

1231038