DocumentCode
2060618
Title
The use of strain compensation layers in the growth of stacked quantum dot structures
Author
Lever, P. ; Stewart, K. ; Fu, L. ; Tan, H.H. ; Jagadish, C.
Author_Institution
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT, Australia
Volume
2
fYear
2003
fDate
12-14 Aug. 2003
Firstpage
848
Abstract
Stacked quantum dot structures with a large number of layers are difficult to fabricate due to the large amount of strain in the dot layers. Dislocations can form from the large degree of strain, also a large amount of interdiffusion occurs during annealing. By inserting thin layers of GaP in the barriers of stacked dot structures the overall strain in the layers is reduced. These structures have an increased photoluminescence intensity. There is also a small blueshift in the photoluminescence of these structures, and a large narrowing of the luminescence linewidth. The structures with GaP strain compensation are shown to be more thermally stable.
Keywords
III-V semiconductors; MOCVD; annealing; dislocation structure; gallium compounds; photoluminescence; semiconductor growth; semiconductor quantum dots; semiconductor thin films; spectral line shift; stress effects; thermal diffusion; thermal stability; GaP; GaP thin layers; annealing; blueshift; dislocations; interdiffusion; luminescence linewidth; photoluminescence intensity; stacked quantum dot structures; strain compensation layers; thermal stability; Annealing; Capacitive sensors; Gallium arsenide; Infrared detectors; Luminescence; Photodetectors; Quantum dot lasers; Quantum dots; Temperature; US Department of Transportation;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN
0-7803-7976-4
Type
conf
DOI
10.1109/NANO.2003.1231047
Filename
1231047
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