DocumentCode :
2061990
Title :
Study on impact of grid connection of distributed photovoltaic system on distribution network peak-valley difference considering photovoltaic volatility
Author :
Jin Xia Li ; Jing Hong Zheng ; Shou Zhen Zhu ; Xiao Yu Wang ; Lian Shu
Author_Institution :
Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
fYear :
2012
fDate :
10-14 Sept. 2012
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, firstly an IEEE 13 node feeder system simulation model is established in Matlab/simulink. Then, taking into consideration the typical photovoltaic output fluctuation and daily load curve of the distribution network, and with simulation method, the study obtains the value of the system peak-valley difference considering the superposition of fluctuation of load and photovoltaic output. Furthermore, the paper studies the relationship between the peak-valley difference and the photovoltaic access modes, as well as capacity and operating condition, thus drawing the law of influence of connected photovoltaic system on peak-valley difference. The conclusions of the study can provide an operation reference for the determination of photovoltaic-grid-connection scheme and the peak regulation and planning of distribution network with connected photovoltaic system.
Keywords :
IEEE standards; fault diagnosis; mathematics computing; photovoltaic power systems; power distribution planning; power engineering computing; power grids; IEEE 13 node feeder system simulation model; Matlab-Simulink; capacity condition; daily load curve; distributed photovoltaic system; distribution network planning; fluctuation superposition; grid connection; operating condition; peak regulation; peak-valley difference; photovoltaic access modes; photovoltaic output fluctuation; photovoltaic volatility; distribution network; fluctuation; peak-valley difference; photovoltaic generation system;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electricity Distribution (CICED), 2012 China International Conference on
Conference_Location :
Shanghai
ISSN :
2161-7481
Print_ISBN :
978-1-4673-6065-4
Electronic_ISBN :
2161-7481
Type :
conf
DOI :
10.1109/CICED.2012.6508643
Filename :
6508643
Link To Document :
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