DocumentCode
2062057
Title
7.2 A 128Gb 3b/cell V-NAND flash memory with 1Gb/s I/O rate
Author
Jae-Woo Im ; Woo-Pyo Jeong ; Doo-Hyun Kim ; Sang-Wan Nam ; Dong-Kyo Shim ; Myung-Hoon Choi ; Hyun-Jun Yoon ; Dae-Han Kim ; You-Se Kim ; Hyun-Wook Park ; Dong-Hun Kwak ; Sang-Won Park ; Seok-Min Yoon ; Wook-Ghee Hahn ; Jin-Ho Ryu ; Sang-Won Shim ; Kyung-Ta
Author_Institution
Samsung Electron., Hwaseong, South Korea
fYear
2015
fDate
22-26 Feb. 2015
Firstpage
1
Lastpage
3
Abstract
Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as smaller tPROG, lower power consumption and longer endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, 128Gb 2b/cell device with 24 stack WL layers was announced in 2014 [1].
Keywords
flash memories; logic design; 3D-stacking technology; V-NAND flash memory; cell-to-cell interference; cost-effective storage devices; Computer architecture; Electrical resistance measurement; Flash memories; Microprocessors; Performance evaluation; Programming; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid- State Circuits Conference - (ISSCC), 2015 IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
978-1-4799-6223-5
Type
conf
DOI
10.1109/ISSCC.2015.7062960
Filename
7062960
Link To Document