• DocumentCode
    2062057
  • Title

    7.2 A 128Gb 3b/cell V-NAND flash memory with 1Gb/s I/O rate

  • Author

    Jae-Woo Im ; Woo-Pyo Jeong ; Doo-Hyun Kim ; Sang-Wan Nam ; Dong-Kyo Shim ; Myung-Hoon Choi ; Hyun-Jun Yoon ; Dae-Han Kim ; You-Se Kim ; Hyun-Wook Park ; Dong-Hun Kwak ; Sang-Won Park ; Seok-Min Yoon ; Wook-Ghee Hahn ; Jin-Ho Ryu ; Sang-Won Shim ; Kyung-Ta

  • Author_Institution
    Samsung Electron., Hwaseong, South Korea
  • fYear
    2015
  • fDate
    22-26 Feb. 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as smaller tPROG, lower power consumption and longer endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, 128Gb 2b/cell device with 24 stack WL layers was announced in 2014 [1].
  • Keywords
    flash memories; logic design; 3D-stacking technology; V-NAND flash memory; cell-to-cell interference; cost-effective storage devices; Computer architecture; Electrical resistance measurement; Flash memories; Microprocessors; Performance evaluation; Programming; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid- State Circuits Conference - (ISSCC), 2015 IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-4799-6223-5
  • Type

    conf

  • DOI
    10.1109/ISSCC.2015.7062960
  • Filename
    7062960