DocumentCode :
2064195
Title :
Session 17 overview: Embedded memory and DRAM I/O: Memory subcommittee
Author :
Chang, Leland ; Yoshikawa, Takefumi
Author_Institution :
IBM, Yorktown Heights, NY
fYear :
2015
fDate :
22-26 Feb. 2015
Firstpage :
308
Lastpage :
309
Abstract :
Demand for smaller and lighter personal devices with increasing functionality in the cloud drives advancements in both embedded memory technology and high-speed DRAM interfaces. Lower power through voltage reduction and increased performance through higher memory density and bandwidth are key enablers. This year´s conference highlights 14nm FinFET technologies with the smallest bit cells achieved to date for both SRAM — at 0.05μm2 — and embedded DRAM — at 0.01747μm2. A new assist technique to drive VMIN reduction and novel bit cells for both 2-port SRAM and TCAM applications are also presented. In addition, two area-efficient techniques to boost DRAM bandwidth are reported.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid- State Circuits Conference - (ISSCC), 2015 IEEE International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
978-1-4799-6223-5
Type :
conf
DOI :
10.1109/ISSCC.2015.7063049
Filename :
7063049
Link To Document :
بازگشت