• DocumentCode
    2064741
  • Title

    A 5kV ESD-protected 2.4GHz PA in 180nm RFCMOS optimized by ESD-PA co-design technique

  • Author

    Zitao Shi ; Xin Wang ; Wang, Aiping ; Yuhua Cheng

  • Author_Institution
    Marvell Tech. Group Ltd., Shanghai, China
  • fYear
    2013
  • fDate
    28-31 Oct. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Electrostatic discharge (ESD) protection is required for all ICs. However, ESD protection inevitably introduce parasitic effects that will negatively affect IC performance, especially for parasitic-sensitive radio-frequency (RF) ICs. This paper reports design optimization of a 2.4GHz power amplifier (PA) circuit with 5kB full-chip ESD protection designed in an 180nm commercial RFCMOS technology. The PA design splits confirm that even an optimized ESD protection structure will affect PA circuit performance, which can be substantially recovered by careful PA-ESD co-design consideration.
  • Keywords
    CMOS analogue integrated circuits; UHF integrated circuits; UHF power amplifiers; electrostatic discharge; integrated circuit design; ESD-PA co-design technique; ESD-protected PA circuit; RFIC; commercial RFCMOS technology; electrostatic discharge protection; frequency 2.4 GHz; full-chip ESD protection; parasitic effects; parasitic-sensitive radio-frequency IC; power amplifier circuit; size 180 nm; voltage 5 kV; Circuit optimization; Degradation; Design optimization; Electrostatic discharges; Integrated circuit modeling; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC (ASICON), 2013 IEEE 10th International Conference on
  • Conference_Location
    Shenzhen
  • ISSN
    2162-7541
  • Print_ISBN
    978-1-4673-6415-7
  • Type

    conf

  • DOI
    10.1109/ASICON.2013.6811874
  • Filename
    6811874