Author :
Chevalier, P. ; Fellous, C. ; Rubaldo, L. ; Dutartre, D. ; Laurens, M. ; Jagueneau, T. ; Leverd, F. ; Bord, S. ; Richard, C. ; Lenoble, D. ; Bonnouvrier, J. ; Marty, M. ; Perrotin, A. ; Gloria, D. ; Saguin, F. ; Barbalat, B. ; Beerkens, R. ; Zerounian, N.
Keywords :
BiCMOS integrated circuits; arsenic; germanium compounds; heterojunction bipolar transistors; millimetre wave bipolar transistors; silicon compounds; wide band gap semiconductors; 230 GHz; 90 nm; As; BiCMOS technology; SiGeC; arsenic-doped monocrystalline emitter; selective epitaxial base; self-aligned HBT; Artificial intelligence; Automotive engineering; BiCMOS integrated circuits; CMOS technology; Cutoff frequency; Epitaxial growth; Heterojunction bipolar transistors; Laser radar; Lithography; Optical fiber communication;