DocumentCode
2066658
Title
In situ analysis of the stress development during fabrication processes of micro-assemblies
Author
Pustan, David ; Rastiagaev, Eugen ; Wilde, Juergen
Author_Institution
IMTEK, Univ. of Freiburg, Freiburg
fYear
2009
fDate
26-29 May 2009
Firstpage
117
Lastpage
124
Abstract
Fabrication processes, like die attachment or plastic encapsulation, lead to thermal stresses in micro-assemblies due to CTE mismatches of the involved materials. In this paper, stress- and strain-sensitive test chips were used to measure in situ absolute stresses caused by die attach and encapsulation processes. Furthermore, deformations of assemblies over temperature were observed by white light interferometry and electronic speckle pattern interferometry. Applying these methods, e.g. the effect of entrapped air in thin adhesive layers of die attach assemblies on the absolute stresses in the silicon chip surface could be observed during cure. The resulting stress offset accounted up to 68% of the thermal stresses at RT in the assembly.
Keywords
deformation; electronic speckle pattern interferometry; encapsulation; microassembling; plastic packaging; thermal analysis; thermal stresses; adhesive layers; die attachment; electronic speckle pattern interferometry; fabrication process; microassembly; plastic encapsulation process; silicon chip surface; strain-sensitive test chips; thermal stress development; white light interferometry; Assembly; Encapsulation; Fabrication; Microassembly; Optical interferometry; Plastics; Semiconductor device measurement; Stress measurement; Testing; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
978-1-4244-4475-5
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2009.5074005
Filename
5074005
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