Design and fabrication of 2×2 and 4×4 biaxial micromirror array

Author

Bai, Yanhui ; Yeow, John T W ; Wilson, Brian C.

Author_Institution

Dept. of Syst. Design Eng., Univ. of Waterloo, Waterloo, ON, Canada

fYear

2010

fDate

25-27 Oct. 2010

Firstpage

1

Lastpage

5

Abstract

This paper presents the design and fabrication of 2×2 and 4×4 biaxial micro-electro-mechanical systems (MEMS) mirror array. The fabrication process was extended from that of previous single micromirror with SW electrodes that bases on silicon-on-insulator (SOI) wafer, hybrid bulk/surface micromachined technology, and a high-aspect-ratio shadow mask. Each mirror plate size is 1000μm×1000μm, thickness 35μm. The gap between mirror plate and bottom electrodes is 300μm. This mirror array is well-suited for application where a large optical aperture is required.

Keywords

micro-optomechanical devices; microfabrication; micromirrors; optical arrays; optical design techniques; optical fabrication; Si-SiO₂; biaxial microelectromechanical systems; biaxial micromirror array design; bottom electrodes; high-aspect-ratio shadow mask; hybrid bulk-surface micromachined technology; mirror plate size; optical aperture; silicon-on-insulator wafer; size 35 mum; Arrays; Electrodes; Micromirrors; Optical device fabrication; Silicon; SOI; micrmirror array; optical aperture; sidewall electrodes;

fLanguage

English

Publisher

ieee

Conference_Titel

Optomechatronic Technologies (ISOT), 2010 International Symposium on

Conference_Location

Toronto, ON

Print_ISBN

978-1-4244-7684-8

Type

conf

DOI

10.1109/ISOT.2010.5687339

Filename

5687339