Title :
A comparison of run-to-run control algorithms
Author :
Campbell, W. Jarrett ; Firth, Stacy K. ; Toprac, Anthony J. ; Edgar, Thomas F.
Author_Institution :
Yield Dynamics Inc., Austin, TX, USA
Abstract :
Run-to-run control is the term used for the application of batch process control as practiced in the semiconductor industry. This paper gives a brief introduction to the fundamental parts of a run-to-run control algorithm and surveys several of the popular techniques for the application of this control methodology. In particular, model predictive control is explored as a robust and flexible technique for implementing run-to-run control.
Keywords :
batch processing (industrial); integrated circuit manufacture; predictive control; production control; robust control; batch process control; model predictive control; robust flexible technique; run-to-run control algorithms; semiconductor industry; Automatic control; Chemical processes; Conductors; Electric variables control; Feedback loop; Inductors; Industrial control; Predictive control; Predictive models; Process control;
Conference_Titel :
American Control Conference, 2002. Proceedings of the 2002
Print_ISBN :
0-7803-7298-0
DOI :
10.1109/ACC.2002.1023955
