DocumentCode
2068421
Title
High-flux capillary based XUV source via the direct engineering of a laser induced ionization profile
Author
Anderson, Patrick N. ; Butcher, Thomas J. ; Horak, Peter ; Frey, Jeremy G. ; Brocklesby, William S.
Author_Institution
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
fYear
2011
fDate
22-26 May 2011
Firstpage
1
Lastpage
1
Abstract
In this work we have used computational modelling to optimize our original capillary design in an effort to minimize the absorption of the generated XUV. Subsequent experimental work has shown a flux increase of almost 50 times over our existing capillary-based source, regardless of the maximum gas pressure.
Keywords
capillarity; light absorption; light sources; optical design techniques; optical harmonic generation; photoionisation; XUV absorption; XUV source; computational modelling; gas pressure; high harmonic generation; high-flux capillary; laser induced ionization profile;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe (CLEO EUROPE/EQEC), 2011 Conference on and 12th European Quantum Electronics Conference
Conference_Location
Munich
ISSN
Pending
Print_ISBN
978-1-4577-0533-5
Electronic_ISBN
Pending
Type
conf
DOI
10.1109/CLEOE.2011.5943040
Filename
5943040
Link To Document