DocumentCode :
2070846
Title :
Hierarchical simulation of hot-carrier induced damages in VLSI circuits
Author :
Leblebici, Y. ; Li, P.C. ; Kang, S.M. ; Hajj, I.N.
Author_Institution :
Illinois Univ., Urbana, IL, USA
fYear :
1991
fDate :
12-15 May 1991
Abstract :
A hierarchical simulation tool is presented for estimating the hot-carrier-induced degradation of nMOS transistor characteristics and circuit performance in large-scale circuits. This information can be used both for understanding the circuit-level dynamics of the degradation mechanisms and as a design aid for improving the long-term reliability through design modifications. A two-tier hierarchical approach is adopted for hot-carrier reliability simulation of large-scale circuits. First, the circuit is simulated using a fast simulator to detect subcircuits likely to cause reliability problems. Then, detailed simulation is performed on the suspected subcircuits. The fast simulation is performed using the mixed-mode simulator iDSIM2, whereas the circuit simulator iSMILE is used for the detailed simulation
Keywords :
MOS integrated circuits; VLSI; circuit CAD; circuit reliability; digital simulation; hot carriers; VLSI circuits; circuit performance; circuit simulator; circuit-level dynamics; design aid; hierarchical simulation tool; hot-carrier induced damages; iDSIM2; iSMILE; long-term reliability; mixed-mode simulator; nMOS transistor characteristics; reliability simulation; subcircuits; two-tier hierarchical approach; Circuit optimization; Circuit simulation; Computational modeling; Degradation; Hot carriers; Integrated circuit reliability; Large-scale systems; MOSFETs; Stress; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 1991., Proceedings of the IEEE 1991
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-0015-7
Type :
conf
DOI :
10.1109/CICC.1991.164036
Filename :
164036
Link To Document :
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