Title :
Structural properties and frequency response of AlN thin film surface acoustic wave device
Author :
Nam, Chang-Woo ; Lee, Kyu-Chul
Author_Institution :
Sch. of Electr. Eng., Ulsan Univ., South Korea
fDate :
26 Jun-3 Jul 2001
Abstract :
An AlN thin film for SAW filter applications was deposited on (100) silicon wafers and sapphire (R-plane) by the reactive magnetron sputtering method. Structural and electrical characteristics of the AlN thin film are presented. The highly oriented (002) plane at various operating conditions was observed by XRD. AFM measurement showed that deposited thin film had a smooth surface. The cross-sectional SEM micrograph showed a well-aligned columnar structure. SAW velocity of the interdigital transducer (IDT)/AlN/Si structure was about 5040 m/s in the center frequency of 126 MHz. Insertion loss was measured to be a relatively low value of 22 dB. SAW velocity of IDT/AlN/sapphire structure was 5960 m/s in the center frequency of 297 MHz, and insertion loss was about 48 dB
Keywords :
X-ray diffraction; aluminium compounds; atomic force microscopy; ceramics; frequency response; losses; scanning electron microscopy; sputter deposition; surface acoustic wave filters; surface structure; 126 MHz; 22 dB; 297 MHz; 48 dB; 5040 m/s; 5960 m/s; AFM measurement; Al2O3; AlN thin film; AlN thin film surface acoustic wave device; AlN-Al2O3; AlN-Si; IDT/AlN/Si structure; IDT/AlN/sapphire structure; SAW filter application; SAW velocity; Si; XRD; center frequency; cross-sectional SEM micrograph; electrical characteristics; frequency response; highly oriented (002) plane; insertion loss; interdigital transducer/AlN/Si structure; operating conditions; sapphire R-plane substrates; silicon (100) wafers; smooth surface; structural properties; well-aligned columnar structure; Electric variables; Frequency response; Insertion loss; Magnetic separation; SAW filters; Semiconductor thin films; Silicon; Sputtering; Surface acoustic waves; Transistors;
Conference_Titel :
Science and Technology, 2001. KORUS '01. Proceedings. The Fifth Russian-Korean International Symposium on
Conference_Location :
Tomsk
Print_ISBN :
0-7803-7008-2
DOI :
10.1109/KORUS.2001.975101
