DocumentCode
2073604
Title
Electrostatics of nanowire transistors
Author
Guo, Jing ; Wang, Jing ; Polizzi, Eric ; Datta, Supriyo ; Lundstrom, Mark
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume
1
fYear
2003
fDate
12-14 Aug. 2003
Firstpage
248
Abstract
The charge transfer doping in metal wire-carbon nanotube junctions has been demonstrated to be important before. In this paper, we investigate the effect of contact geometry, metal work function and insulator dielectric constant on the charge transfer doping into a nanowire channel. We then explore the effect of charge transfer doping on the operation of nanowire transistors. We show that the nanowire transistors with large gate underlap can still deliver an appreciable amount of on-current, which provides a possible explanation for a recent experiment by Javey et al. At the same time, charge transfer doping also imposes constraints on the transistor design.
Keywords
MIM structures; carbon nanotubes; dielectric materials; field effect transistors; nanotube devices; nanowires; permittivity; semiconductor device models; work function; C; charge transfer doping; electrostatics; insulator dielectric constant; metal work function; nanowire channel; nanowire transistors; Carbon nanotubes; Charge transfer; Coaxial components; Dielectric constant; Dielectrics and electrical insulation; Electrodes; Electrostatics; Geometry; Metal-insulator structures; Semiconductor device doping;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN
0-7803-7976-4
Type
conf
DOI
10.1109/NANO.2003.1231762
Filename
1231762
Link To Document