DocumentCode :
2073604
Title :
Electrostatics of nanowire transistors
Author :
Guo, Jing ; Wang, Jing ; Polizzi, Eric ; Datta, Supriyo ; Lundstrom, Mark
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume :
1
fYear :
2003
fDate :
12-14 Aug. 2003
Firstpage :
248
Abstract :
The charge transfer doping in metal wire-carbon nanotube junctions has been demonstrated to be important before. In this paper, we investigate the effect of contact geometry, metal work function and insulator dielectric constant on the charge transfer doping into a nanowire channel. We then explore the effect of charge transfer doping on the operation of nanowire transistors. We show that the nanowire transistors with large gate underlap can still deliver an appreciable amount of on-current, which provides a possible explanation for a recent experiment by Javey et al. At the same time, charge transfer doping also imposes constraints on the transistor design.
Keywords :
MIM structures; carbon nanotubes; dielectric materials; field effect transistors; nanotube devices; nanowires; permittivity; semiconductor device models; work function; C; charge transfer doping; electrostatics; insulator dielectric constant; metal work function; nanowire channel; nanowire transistors; Carbon nanotubes; Charge transfer; Coaxial components; Dielectric constant; Dielectrics and electrical insulation; Electrodes; Electrostatics; Geometry; Metal-insulator structures; Semiconductor device doping;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
Type :
conf
DOI :
10.1109/NANO.2003.1231762
Filename :
1231762
Link To Document :
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