Title :
Vacuum arc ion and plasma source Raduga-5. Technological applications
Author :
Ryabchikov, A.I. ; Stepanov, I.B. ; Dektyarev, S.V. ; Shulepov, I.A. ; Lukonin, E.I. ; Sivin, D.O.
Author_Institution :
Inst. of Nucl. Phys., Tomsk Polytech. Univ., Russia
fDate :
26 Jun-3 Jul 2001
Abstract :
The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered
Keywords :
ion implantation; ion sources; plasma deposition; plasma production; vacuum arcs; DC vacuum arc discharge; Raduga-5; accelerated ion source; coatings; doping; dynamic ion mixing; high average power beams; high-intensity high-concentration ion implantation; ion beam application; ion plasma deposition; microparticle fraction; substrate; vacuum arc ion source; vacuum arc plasma source; wide transition layers; Acceleration; Coatings; Ion implantation; Plasma accelerators; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma properties; Plasma sources; Vacuum arcs;
Conference_Titel :
Science and Technology, 2001. KORUS '01. Proceedings. The Fifth Russian-Korean International Symposium on
Conference_Location :
Tomsk
Print_ISBN :
0-7803-7008-2
DOI :
10.1109/KORUS.2001.975158
