DocumentCode
2074596
Title
PVD of coatings based on plasma filter application
Author
Ryabchikov, A.I. ; Stepanov, I.B. ; Shulepov, I.A.
Author_Institution
Inst. of Nucl. Phys., Tomsk Polytech. Univ., Russia
Volume
1
fYear
2001
fDate
26 Jun-3 Jul 2001
Firstpage
383
Abstract
The paper presents the results of investigating the formation of vacuum-arc plasma flow cleaned from the microparticle fraction. The plasma filter design is based on plasma spread in a channel formed by electrodes located at an angle with the axis of an arc evaporator. The effects of magnetic insulation of the electrodes and the positive near-electrode potential drop on the mechanisms of charged plasma component spread are investigated. The results of the obtained experimental data are discussed
Keywords
plasma deposition; plasma flow; vacuum arcs; PVD; arc evaporator; channel; charged plasma component spread; coatings; electrodes; magnetic insulation; microparticle fraction; plasma filter design; positive near-electrode potential drop; vacuum-arc plasma flow; Atherosclerosis; Cathodes; Coatings; Electrodes; Optical filters; Plasma applications; Plasma devices; Plasma properties; Rough surfaces; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Science and Technology, 2001. KORUS '01. Proceedings. The Fifth Russian-Korean International Symposium on
Conference_Location
Tomsk
Print_ISBN
0-7803-7008-2
Type
conf
DOI
10.1109/KORUS.2001.975159
Filename
975159
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