Title :
Modeling transport in nanoscale silicon and molecular devices on parallel machines
Author :
Goasguen, Sébastien ; Venugopal, Ramesh ; Lundstrom, Mark S.
Author_Institution :
Purdue Univ., West Lafayette, IN, USA
Abstract :
In this paper we demonstrate a technique to parallelize nanoscale device simulators, developed using the Non-equilibrium Green´s Function (NEGF) formalism. More specifically we present a computationally intensive problem: Current flow through a flared out double-gate silicon MOSFET. We demonstrate how internal quantities of interest that are computed piecewise on different processors can be communicated to and reconstructed on the master for scientific visualization. Parallelization is done under Matlab, which is a user friendly scientific computing environment widely used for research. It allows for rapid prototyping of novel algorithms and enables easy visualization of simulated results. We show results that demonstrate the parallelization of the NEGF solver for flared out double gate device structures with scattering. Parallelization, as described in this paper, allows us to gain tremendous insight into the physics of transport in such devices where mode-coupling due to scattering is important.
Keywords :
Green´s function methods; MOSFET; digital simulation; elemental semiconductors; molecular electronics; nanostructured materials; semiconductor device models; silicon; Matlab parallelization; Si; algorithms; current flow; flared out double gate silicon MOSFET; molecular devices; nanoscale device simulators parallelisation; nanoscale silicon; nonequilibrium Green Function formalism; parallel machines; rapid prototyping; scientific computing environment; scientific visualization; transport modeling; user friendly scientific computing environment; Computational modeling; Green´s function methods; MOSFET circuits; Mathematical model; Nanoscale devices; Parallel machines; Scattering; Scientific computing; Silicon; Visualization;
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
DOI :
10.1109/NANO.2003.1231802