• DocumentCode
    2075206
  • Title

    350K operating silicon nanowire single electron/hole transistors scaled down to 3.4nm diameter and 10nm gate length

  • Author

    Lavieville, R. ; Barraud, S. ; Corna, A. ; Jehl, X. ; Sanquer, M. ; Vinet, M.

  • Author_Institution
    LETI MTNATEC, CEA, Grenoble, France
  • fYear
    2015
  • fDate
    26-28 Jan. 2015
  • Firstpage
    9
  • Lastpage
    12
  • Abstract
    For the first time, we report the operation of Single Electron Transistors (SETs) and Single Hole transistors (SHTs) up to 350K from Q-gate CMOS transistors at ultimate scaling. These results are obtained with gate lengths (LG) scaled down to 10nm and ~3.4nm diameter silicon nanowires (Si-NWs). The SETs and SHTs exhibit Coulomb oscillations in the nanoampere range up to 350 K which can be amplified to the milliampere range when coupled with conventional metal-oxide-semiconductor field-effect transistors (MOSFETs). Such a hybrid circuit is used further as negative differential resistance or as literal gate for logic. These demonstrations of SHT-FET coupling with LG=10nm operating at 350 K should invigorate the community on the future of single-electron devices and their circuit integration.
  • Keywords
    elemental semiconductors; nanoelectronics; nanowires; negative resistance devices; silicon; single electron transistors; Coulomb oscillations; Q-gate CMOS transistors; Si; hybrid circuit; literal gate; metal oxide semiconductor field effect transistors; milliampere range transistor; nanoampere range transistor; negative differential resistance; operating silicon nanowire; single electron transistor; single hole transistor; size 10 nm; size 3.4 nm; temperature 350 K; CMOS integrated circuits; Fabrication; Logic gates; MOSFET; Oscillators; Silicon; 350K operation; Nanowire; Silicon; Single electron transistor; Single hole transistor; hybrid circuit;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultimate Integration on Silicon (EUROSOI-ULIS), 2015 Joint International EUROSOI Workshop and International Conference on
  • Conference_Location
    Bologna
  • Type

    conf

  • DOI
    10.1109/ULIS.2015.7063760
  • Filename
    7063760