DocumentCode :
2075206
Title :
350K operating silicon nanowire single electron/hole transistors scaled down to 3.4nm diameter and 10nm gate length
Author :
Lavieville, R. ; Barraud, S. ; Corna, A. ; Jehl, X. ; Sanquer, M. ; Vinet, M.
Author_Institution :
LETI MTNATEC, CEA, Grenoble, France
fYear :
2015
fDate :
26-28 Jan. 2015
Firstpage :
9
Lastpage :
12
Abstract :
For the first time, we report the operation of Single Electron Transistors (SETs) and Single Hole transistors (SHTs) up to 350K from Q-gate CMOS transistors at ultimate scaling. These results are obtained with gate lengths (LG) scaled down to 10nm and ~3.4nm diameter silicon nanowires (Si-NWs). The SETs and SHTs exhibit Coulomb oscillations in the nanoampere range up to 350 K which can be amplified to the milliampere range when coupled with conventional metal-oxide-semiconductor field-effect transistors (MOSFETs). Such a hybrid circuit is used further as negative differential resistance or as literal gate for logic. These demonstrations of SHT-FET coupling with LG=10nm operating at 350 K should invigorate the community on the future of single-electron devices and their circuit integration.
Keywords :
elemental semiconductors; nanoelectronics; nanowires; negative resistance devices; silicon; single electron transistors; Coulomb oscillations; Q-gate CMOS transistors; Si; hybrid circuit; literal gate; metal oxide semiconductor field effect transistors; milliampere range transistor; nanoampere range transistor; negative differential resistance; operating silicon nanowire; single electron transistor; single hole transistor; size 10 nm; size 3.4 nm; temperature 350 K; CMOS integrated circuits; Fabrication; Logic gates; MOSFET; Oscillators; Silicon; 350K operation; Nanowire; Silicon; Single electron transistor; Single hole transistor; hybrid circuit;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (EUROSOI-ULIS), 2015 Joint International EUROSOI Workshop and International Conference on
Conference_Location :
Bologna
Type :
conf
DOI :
10.1109/ULIS.2015.7063760
Filename :
7063760
Link To Document :
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