Title :
Effect of independently sized gates on the delay of reconfigurable silicon nanowire transistor based circuits
Author :
Trommer, Jens ; Slesazeck, Stefan ; Weber, Walter M. ; Heinzig, Andre ; Baldauf, Tim ; Mikolajick, Thomas
Author_Institution :
Namlab gGmbH Dresden, Dresden, Germany
Abstract :
Reconfigurable silicon nanowire field effect transistors (RFETs) provide both operation modes of p-type and n-type field effect transistors in a single multigate device. This unique feature provides additional degrees of freedom in terms of circuit design and device layout. Here a device-circuit co-design study of a novel 1-bit full adder with only 20 transistors is presented. The delay of the adder is analyzed using the logical effort theory and compared to standard CMOS implementation. The effect of independent gate sizing on device and circuit characteristics will be discussed. It will be shown that asymmetric gates can be exploited to reduce the critical delay of the new adder by 15 %, although the individual device performance is kept constant.
Keywords :
CMOS integrated circuits; adders; delays; field effect transistors; integrated circuit design; nanowires; silicon; sizing (materials processing); CMOS; RFET; asymmetric gate; circuit design; complementary metal oxide semiconductor; critical delay reduction; degrees of freedom; device layout; device-circuit codesign; full adder delay; independent gate sizing effect; logical effort theory; multigate device; n-type field effect transistor; p-type field effect transistor; reconfigurable silicon nanowire field effect transistor; transistor circuit; word length 1 bit; Adders; CMOS integrated circuits; Delays; Field effect transistors; Logic gates; Silicon; RFET; Schottky barrier; Schottky field effect transistor; device-circuit co-design; functional enhanced devices; logic gates; logical effort; multigate; polarity control; reconfigurable transistor; silicon nanowires;
Conference_Titel :
Ultimate Integration on Silicon (EUROSOI-ULIS), 2015 Joint International EUROSOI Workshop and International Conference on
Conference_Location :
Bologna
DOI :
10.1109/ULIS.2015.7063762