DocumentCode :
2075624
Title :
Impact of hot carrier stress on the defect density and mobility in double-gated graphene field-effect transistors
Author :
Illarionov, Yu.Yu. ; Waltl, M. ; Smith, A.D. ; Vaziri, S. ; Ostling, M. ; Lemme, M.C. ; Crasser, T.
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2015
fDate :
26-28 Jan. 2015
Firstpage :
81
Lastpage :
84
Abstract :
We study the impact of hot-carrier degradation (HCD) on the performance of graphene field-effect transistors (GFETs) for different polarities of HC and bias stress. Our results show that the impact of HCD consists in a change of both charged defect density and carrier mobility. At the same time, the mobility degradation agrees with an attractive/repulsive scattering asymmetry and can be understood based on the analysis of the defect density variation.
Keywords :
carrier mobility; field effect transistors; graphene devices; hot carriers; C; GFET; HCD; attractive-repulsive scattering asymmetry; bias stress; carrier mobility; charged defect density; defect mobility; double-gated graphene field-effect transistors; hot carrier degradation; hot carrier stress; mobility degradation; Degradation; Graphene; Logic gates; Reliability; Scattering; Stress; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (EUROSOI-ULIS), 2015 Joint International EUROSOI Workshop and International Conference on
Conference_Location :
Bologna
Type :
conf
DOI :
10.1109/ULIS.2015.7063778
Filename :
7063778
Link To Document :
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