DocumentCode :
2075936
Title :
Effects of electrical stress and ionizing radiation on Si-based TFETs
Author :
Lili Ding ; Gerardin, Simone ; Paccagnella, Alessandro ; Gnani, Elena ; Bagatin, Marta ; Driussi, Francesco ; Selmi, Luca ; Le Royer, Cyrille
Author_Institution :
DEI, Univ. of Padova, Padua, Italy
fYear :
2015
fDate :
26-28 Jan. 2015
Firstpage :
137
Lastpage :
140
Abstract :
The effects of electrical stress and ionizing radiation on the characteristics of Si-based TFETs were investigated experimentally. We found that the electrical stress effects in TFETs could not be ignored in radiation tests, since they can possibly overwhelm the radiation-induced degradation. Under this circumstance, a lower gate voltage under which the electrical stress effects were suppressed induced a stronger radiation-induced degradation in threshold voltage shift and interface traps accumulation.
Keywords :
elemental semiconductors; field effect transistors; interface states; radiation hardening (electronics); silicon; Si; electrical stress effect suppression; gate voltage; interface trap accumulation; ionizing radiation; radiation tests; radiation-induced degradation; silicon-based TFET; threshold voltage shift; Current measurement; Degradation; Ionizing radiation; Logic gates; MOSFET; Radiation effects; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (EUROSOI-ULIS), 2015 Joint International EUROSOI Workshop and International Conference on
Conference_Location :
Bologna
Type :
conf
DOI :
10.1109/ULIS.2015.7063792
Filename :
7063792
Link To Document :
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