Plasma diagnostics for monitoring and control

As part of manufacturing optimisation, there is a need for a suite of diagnostics able to monitor relevant plasma and surface parameters working within a framework capable of making intelligent deductions and directing appropriate actions. This report concerns the use of an artificial intelligence (AI) approach to plasma process control using a number of plasma diagnostics in situ surface diagnostics could easily be incorporated, but are not considered here. Specific examples are taken from a project concerned with AI control of the deposition of carbonaceous films from a radio frequency plasma