Grid-controlled 100-kV electron-beam source for SCALPEL [lithography]

Results show that, with the grid-controlled gun, uniform beam profile can be obtained using nonuniform surface cathode. One can conclude that a traditional polished tantalum emitter might be replaced with more efficient, long lasting one in the SCALPEL grid-controlled gun. Both modeling and experimental results show the possibility of building a 100 kV electron beam source providing high-current, high-emittance, uniform electron beam for the high throughput SCALPEL exposure tool.