DocumentCode
2077330
Title
Grid-controlled 100-kV electron-beam source for SCALPEL [lithography]
Author
Katsap, V. ; Waskiewicz, W.K. ; Sewell, P.B. ; Rouse, J.A. ; Read, F.H.
Author_Institution
Lucent Technol., Murray Hill, NJ, USA
fYear
2000
fDate
2-4 May 2000
Abstract
Results show that, with the grid-controlled gun, uniform beam profile can be obtained using nonuniform surface cathode. One can conclude that a traditional polished tantalum emitter might be replaced with more efficient, long lasting one in the SCALPEL grid-controlled gun. Both modeling and experimental results show the possibility of building a 100 kV electron beam source providing high-current, high-emittance, uniform electron beam for the high throughput SCALPEL exposure tool.
Keywords
cathodes; electron beam lithography; electron guns; 100 kV; SCALPEL; electron beam lithography; exposure tool; grid-controlled electron-beam source; grid-controlled gun; high-current beam; high-emittance beam; nonuniform surface cathode; uniform beam profile; uniform electron beam; Brightness; Cathodes; Crystallization; Current control; Current density; Electron beams; Electron emission; Heating; Lithography; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2000. Abstracts. International
Conference_Location
Monterey, CA, USA
Print_ISBN
0-7803-5987-9
Type
conf
DOI
10.1109/OVE:EC.2000.847556
Filename
847556
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