• DocumentCode
    2077387
  • Title

    Spatially Resolved Resistivity Measurements in Semiconductor Wafers using Microwave Techniques

  • Author

    Bothra, S. ; Borrego, J.M.

  • Author_Institution
    Microelectronics Center of N. Carolina, Research Triangle Park, NC 27709
  • Volume
    2
  • fYear
    1990
  • fDate
    9-13 Sept. 1990
  • Firstpage
    990
  • Lastpage
    995
  • Abstract
    In this paper we present a 35 Ghz microwave reflection system which we have used for measuring the resistivity of semiconductor wafers. By using a tapered parallel plate antenna for directing the microwave radiation on to the wafer there is no need for placing the sample inside a waveguide. The system can measure resistivity in the range of 0.5 ¿-cm to 50 ¿-cm with a spatial resolution of 0.040" × 0.040" which is similar to what can be achieved using standard four point probes.
  • Keywords
    Antenna measurements; Conductivity measurement; Measurement standards; Microwave antennas; Microwave measurements; Microwave theory and techniques; Probes; Reflection; Semiconductor waveguides; Spatial resolution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 1990. 20th European
  • Conference_Location
    Budapest, Hungary
  • Type

    conf

  • DOI
    10.1109/EUMA.1990.336194
  • Filename
    4136131
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2077387