DocumentCode
2079055
Title
Electrical impedance tomography based sensors for semiconductor manufacturing
Author
Kruger, M.V.P. ; Poolla, Kameshwar ; Spanos, Costas J.
Author_Institution
Dept. of Mech. Eng., California Univ., Berkeley, CA, USA
Volume
5
fYear
2002
fDate
2002
Firstpage
3678
Abstract
This paper explores the feasibility of a class of sensors for semiconductor manufacturing based on Electrical Impedance Tomography. We briefly summarize the role of sensors in semiconductor manufacturing and the essential principles of Electrical Impedance Tomography. We then discuss numerical aspects of the EIT problem that arise in the context of our specific application. We have built a prototype etch rate sensor based on these ideas. We discuss both experimental and simulation results from this sensor.
Keywords
electric sensing devices; semiconductor device manufacture; tomography; electrical impedance tomography; prototype etch rate sensor; semiconductor manufacturing; Biomedical measurements; Computer aided manufacturing; Etching; Impedance; Mechanical engineering; Mechanical sensors; Metrology; Pulp manufacturing; Semiconductor device manufacture; Tomography;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2002. Proceedings of the 2002
ISSN
0743-1619
Print_ISBN
0-7803-7298-0
Type
conf
DOI
10.1109/ACC.2002.1024499
Filename
1024499
Link To Document