Title :
Further advances in electron beam recording
Author_Institution :
Nimbus Technol. & Eng. Ltd., Wyastone Leys, UK
Abstract :
Initial process trials have concentrated on making continuous groove structures. This allows the mechanical and beam stability of the electron beam mastering system to be fully evaluated. The process conditions for different resists and developers have been evaluated. However, unlike e-beam lithography, for optical disc mastering it is essential to be able to control the slope of feature edges in thin resist layers making the choice of resist and process conditions even more critical.
Keywords :
atomic force microscopy; electron resists; optical disc storage; optical fabrication; stability; 30 GB; continuous groove structures; developers; electron beam mastering system; electron beam recording; electron beam resists; electron beam stability; feature edges; initial process trials; mechanical stability; optical disc mastering; resists; thin resist layers; Biomedical optical imaging; Electron beams; Electron optics; Electron sources; Magnetic recording; Nose; Optical recording; Position measurement; Vacuum systems; Valves;
Conference_Titel :
Optical Data Storage, 2000. Conference Digest
Conference_Location :
Whisler, BC, Canada
Print_ISBN :
0-7803-5950-X
DOI :
10.1109/ODS.2000.847963
