• DocumentCode
    2082382
  • Title

    Further advances in electron beam recording

  • Author

    Reynolds, G.

  • Author_Institution
    Nimbus Technol. & Eng. Ltd., Wyastone Leys, UK
  • fYear
    2000
  • fDate
    14-17 May 2000
  • Firstpage
    6
  • Lastpage
    8
  • Abstract
    Initial process trials have concentrated on making continuous groove structures. This allows the mechanical and beam stability of the electron beam mastering system to be fully evaluated. The process conditions for different resists and developers have been evaluated. However, unlike e-beam lithography, for optical disc mastering it is essential to be able to control the slope of feature edges in thin resist layers making the choice of resist and process conditions even more critical.
  • Keywords
    atomic force microscopy; electron resists; optical disc storage; optical fabrication; stability; 30 GB; continuous groove structures; developers; electron beam mastering system; electron beam recording; electron beam resists; electron beam stability; feature edges; initial process trials; mechanical stability; optical disc mastering; resists; thin resist layers; Biomedical optical imaging; Electron beams; Electron optics; Electron sources; Magnetic recording; Nose; Optical recording; Position measurement; Vacuum systems; Valves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Data Storage, 2000. Conference Digest
  • Conference_Location
    Whisler, BC, Canada
  • Print_ISBN
    0-7803-5950-X
  • Type

    conf

  • DOI
    10.1109/ODS.2000.847963
  • Filename
    847963
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2082382