DocumentCode :
2082603
Title :
Near-field phase-change recording using a GaN laser diode
Author :
Kishima, K. ; Tchimura, I. ; Yamamoto, K. ; Osato, K. ; Kuroda, Y. ; Iida, A. ; Saito, K.
Author_Institution :
Dev. Center, Sony Corp. Home Network Co., Tokyo, Japan
fYear :
2000
fDate :
14-17 May 2000
Firstpage :
33
Lastpage :
35
Abstract :
We demonstrated near-field recording with the combination of a GaN laser diode and a 1.5 NA objective lens. The realized linear bit density was less than 90 nm (corresponding to the areal recording density over 40 Gbit/in/sup 2/) regardless of using a small 1.0 mm-diameter super-hemispherical solid immersion lens (SIL). Further improvement of a near-field phase-change optical disk will enable a linear bit density of 80 nm or less. In this talk we shall also report the fabrication process of the plateau, and of the electrode on the SIL.
Keywords :
electrodes; lenses; optical disc storage; optical fabrication; semiconductor lasers; solid-state phase transformations; 1 mm; GaN; GaN laser diode; areal recording density; electrode; fabrication process; linear bit density; near-field phase-change optical disk; near-field phase-change recording; near-field recording; objective lens; super-hemispherical solid immersion lens; Air gaps; Diode lasers; Electrodes; Gallium nitride; Laser beams; Lenses; Optical recording; Optical refraction; Optical variables control; Servomechanisms;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Data Storage, 2000. Conference Digest
Conference_Location :
Whisler, BC, Canada
Print_ISBN :
0-7803-5950-X
Type :
conf
DOI :
10.1109/ODS.2000.847972
Filename :
847972
Link To Document :
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