DocumentCode
2082676
Title
The fabrication and characterization of nano-aperture VCSEL array head for high density near-field optical data storage
Author
Young-Joo Kim ; Kurihara, K. ; Suzuki, K. ; Yamaguchi, A. ; Goto, K.
Author_Institution
Dept. of Inf. & Commun. Technol., Tokai Univ., Kanagawa, Japan
fYear
2000
fDate
14-17 May 2000
Firstpage
42
Lastpage
45
Abstract
A 2D nano-aperture VCSEL array head of near-field optics was studied with the formation of small aperture on the VCSEL surface after the deposition of dielectric and metal films. Its optical properties were also characterized to apply the VCSEL array for the near-field optical memory system of higher data capacity and speed. In this study, we could produce very small aperture of around 50 nm in diameter successfully using a focused ion beam (FIB) method, and get the reasonable increasement in the laser power with the formation of nano-aperture on each VCSEL emitting surface.
Keywords
focused ion beam technology; nanotechnology; optical disc storage; semiconductor laser arrays; surface emitting lasers; 2D nano-aperture VCSEL array head; 50 nm; VCSEL emitting surface; VCSEL surface; data capacity; dielectric films; focused ion beam method; high density near-field optical data storage; laser power; metal films; nano-aperture; nano-aperture VCSEL array head fabrication; near-field optical memory system; near-field optics; optical properties; small aperture; very small aperture; Apertures; Dielectric films; Ion beams; Optical arrays; Optical device fabrication; Optical films; Particle beam optics; Stimulated emission; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Data Storage, 2000. Conference Digest
Conference_Location
Whisler, BC, Canada
Print_ISBN
0-7803-5950-X
Type
conf
DOI
10.1109/ODS.2000.847975
Filename
847975
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