DocumentCode
2082972
Title
Mark edge jitter model for phase change recording
Author
Sheila, A.C. ; Schlesinger, T.E. ; Lambeth, D.N.
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2000
fDate
14-17 May 2000
Firstpage
80
Lastpage
82
Abstract
We model nucleation and grain growth in GeSbTe, and evaluate the jitter based on the randomness of the nucleation process. We consider the case in which an amorphous mark is written on a previously existing amorphous mark. If the previously written amorphous mark was perfectly quenched with no nuclei in it, then we would have all new nuclei followed by their growth. In practice, however, there usually will be some quenched-in nuclei and the number of these will depend on the rate of cooling at the time of formation of the previous amorphous mark. We have studied the effect of these pre-existing nuclei and control of the temperature profile by changing the reflection layer thickness on nucleation, grain growth and jitter.
Keywords
antimony alloys; crystallisation; germanium alloys; jitter; nucleation; optical storage; solid-state phase transformations; terbium alloys; GeSbTe; amorphous mark; cooling; grain growth; mark edge jitter model; nucleation; nucleation process randomness; phase change recording; quenched; quenched-in nuclei; reflection layer thickness; temperature profile; Amorphous materials; Crystalline materials; Crystallization; Data storage systems; Isothermal processes; Jitter; Phase change materials; Ring lasers; Temperature dependence; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Data Storage, 2000. Conference Digest
Conference_Location
Whisler, BC, Canada
Print_ISBN
0-7803-5950-X
Type
conf
DOI
10.1109/ODS.2000.847987
Filename
847987
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