• DocumentCode
    2082972
  • Title

    Mark edge jitter model for phase change recording

  • Author

    Sheila, A.C. ; Schlesinger, T.E. ; Lambeth, D.N.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • fYear
    2000
  • fDate
    14-17 May 2000
  • Firstpage
    80
  • Lastpage
    82
  • Abstract
    We model nucleation and grain growth in GeSbTe, and evaluate the jitter based on the randomness of the nucleation process. We consider the case in which an amorphous mark is written on a previously existing amorphous mark. If the previously written amorphous mark was perfectly quenched with no nuclei in it, then we would have all new nuclei followed by their growth. In practice, however, there usually will be some quenched-in nuclei and the number of these will depend on the rate of cooling at the time of formation of the previous amorphous mark. We have studied the effect of these pre-existing nuclei and control of the temperature profile by changing the reflection layer thickness on nucleation, grain growth and jitter.
  • Keywords
    antimony alloys; crystallisation; germanium alloys; jitter; nucleation; optical storage; solid-state phase transformations; terbium alloys; GeSbTe; amorphous mark; cooling; grain growth; mark edge jitter model; nucleation; nucleation process randomness; phase change recording; quenched; quenched-in nuclei; reflection layer thickness; temperature profile; Amorphous materials; Crystalline materials; Crystallization; Data storage systems; Isothermal processes; Jitter; Phase change materials; Ring lasers; Temperature dependence; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Data Storage, 2000. Conference Digest
  • Conference_Location
    Whisler, BC, Canada
  • Print_ISBN
    0-7803-5950-X
  • Type

    conf

  • DOI
    10.1109/ODS.2000.847987
  • Filename
    847987