Propagation Constant and Electromagnetic Field Distribution of Metal-Insulator-Semiconductor Transmission Lines

An efficient technique for calculating the electromagnetic fields of metal-insulator-semiconductor (MIS) transmission lines is presented. MIS transmission lines with typical dimensions of integrated circuits are analysed. In dependence to the conductivity of the semiconductor layer, the propagation constant is evaluated and three distinct modes of propagation are discussed. In order to illustrate the mechanism of propagation the complete electromagnetic field distribution is calculated for each mode. To verify the theory, numerical results obtained from the analysis of transmission lines were compared with published theoretical and experimental data [1, 2]. Transmission lines analysed in this paper are essentially smaller, the linewidth is typical for integrated circuits.