• DocumentCode
    2084969
  • Title

    Multilayer electroformed devices on silicon substrates

  • Author

    Holmes, A.S. ; Lee, K.W.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Imperial Coll. of Sci., Technol. & Med., London, UK
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    42491
  • Lastpage
    42494
  • Abstract
    A simple, low-temperature UV electroforming process has been described which is capable of producing multi-level nickel devices on silicon substrates. The process has been used to realise two-axis electrostatic resonators, in which resonant excitation and electrothermal tuning have been demonstrated
  • Keywords
    electroforming; Si; electrothermal tuning; low-temperature UV electroforming process; multilayer electroformed devices; resonant excitation; two-axis electrostatic resonators;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Demonstrated Micromachining Technologies for Industry (Ref. No. 2000/032), IEE Seminar on
  • Conference_Location
    Birmingham
  • Type

    conf

  • DOI
    10.1049/ic:20000185
  • Filename
    848117