Title :
Nano-photolithography using a visible light based on the nonadiabatic near-field photochemical reaction
Author :
Kawazoe, T. ; Haga, Ryoichi ; Ohtsu, Motoichi
Author_Institution :
SORST, Japan Sci. & Technol. Agency, Tokyo
Abstract :
We applied nonadiabatic near-field photochemical reaction to the photolithography. The optical near field with the steep spatial gradient of optical power activates the unique photochemical reaction and enables nanometric patterning even by using visible light
Keywords :
nanopatterning; optical fabrication; photochemistry; photolithography; nanometric patterning; nanophotolithography; nonadiabatic near-field photochemical reaction; visible light;
Conference_Titel :
Quantum Electronics Conference, 2004. (IQEC). International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-55752-778-4
