Title :
2005 IEEE International Symposium on Semiconductor Manufacturing
Abstract :
The following topics were dealt with: environment; safety; health; factory design; automated material handling; manufacturing control; manufacturing management; process control; process monitoring; robust engineering; process equipment; metrology equipment; process optimization; material optimization; contamination control; ultraclean technology; and yield enhancement methodology
Keywords :
contamination; design; environmental factors; health and safety; integrated circuit manufacture; integrated circuit measurement; materials handling; process control; process monitoring; production control; production engineering computing; production equipment; production facilities; automated material handling; contamination control; environment; factory design; health; manufacturing control; manufacturing management; material optimization; metrology equipment; process control; process equipment; process monitoring; process optimization; robust engineering; safety; ultraclean technology; yield enhancement methodology;
Conference_Titel :
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9143-8
DOI :
10.1109/ISSM.2005.1513276
