• DocumentCode
    2089170
  • Title

    Effective utilization (Ue) - a breakthrough performance indicator for machine efficiency improvement

  • Author

    Lopez, Peter ; Terry, Adam ; Daniely, David ; Kalir, Adar

  • Author_Institution
    Intel Corp., Rio Rancho, NM
  • fYear
    2005
  • fDate
    13-15 Sept. 2005
  • Firstpage
    63
  • Lastpage
    66
  • Abstract
    In today´s high stakes semiconductor industry, cost accounting demands high machine utilization and world class throughput time. The greater the utilization of capital equipment, the greater the return on investment [W. Hopp et al., 1996]. One of the major challenges facing most manufacturing facilities has been the inability to sustain world class equipment utilization and factory throughput time [J. Black et al., 2002]. This paper details how, through a breakthrough system called effective utilization (Ue), major advances in achieving higher predictable utilization and increased WIP velocity were made in both 200 mm and 300 mm Intel manufacturing facilities
  • Keywords
    cost accounting; integrated circuit manufacture; production equipment; production facilities; work in progress; Intel manufacturing facilities; WIP velocity; capital equipment utilization; cost accounting; effective utilization; factory throughput time; machine efficiency improvement; machine utilization; performance indicator; semiconductor industry; world class equipment utilization; world class throughput time; Automatic control; Control systems; Cost accounting; Electric breakdown; Electronics industry; Inventory control; Logic arrays; Manufacturing; Production facilities; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-9143-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2005.1513297
  • Filename
    1513297