DocumentCode
2089170
Title
Effective utilization (Ue) - a breakthrough performance indicator for machine efficiency improvement
Author
Lopez, Peter ; Terry, Adam ; Daniely, David ; Kalir, Adar
Author_Institution
Intel Corp., Rio Rancho, NM
fYear
2005
fDate
13-15 Sept. 2005
Firstpage
63
Lastpage
66
Abstract
In today´s high stakes semiconductor industry, cost accounting demands high machine utilization and world class throughput time. The greater the utilization of capital equipment, the greater the return on investment [W. Hopp et al., 1996]. One of the major challenges facing most manufacturing facilities has been the inability to sustain world class equipment utilization and factory throughput time [J. Black et al., 2002]. This paper details how, through a breakthrough system called effective utilization (Ue), major advances in achieving higher predictable utilization and increased WIP velocity were made in both 200 mm and 300 mm Intel manufacturing facilities
Keywords
cost accounting; integrated circuit manufacture; production equipment; production facilities; work in progress; Intel manufacturing facilities; WIP velocity; capital equipment utilization; cost accounting; effective utilization; factory throughput time; machine efficiency improvement; machine utilization; performance indicator; semiconductor industry; world class equipment utilization; world class throughput time; Automatic control; Control systems; Cost accounting; Electric breakdown; Electronics industry; Inventory control; Logic arrays; Manufacturing; Production facilities; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location
San Jose, CA
Print_ISBN
0-7803-9143-8
Type
conf
DOI
10.1109/ISSM.2005.1513297
Filename
1513297
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