Systematic method to optimize conditioning process through real time plasma monitoring

Author

Baek, Kye Hyun ; Kim, Yong Jin ; Min, Gyung Jin ; Kang, Chang Jin ; Cho, Han Ku ; Moon, Joo Tae

Author_Institution

Semicond. R&D Center, Samsung Electron., Co. Ltd., Gyeonggi-Do

fYear

2005

fDate

13-15 Sept. 2005

Firstpage

129

Lastpage

131

Abstract

A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each chamber condition is determined quickly. Through this real time analysis and rapid action, total time to optimize the conditioning process is significantly reduced

Keywords

integrated circuit manufacture; plasma diagnostics; plasma materials processing; sputter etching; chamber conditions; conditioning process; optical emission spectroscopy; real time analysis; real time plasma monitoring tools; self-excited electron resonance spectroscopy; systematic method; Cleaning; Condition monitoring; Electrons; Optimization methods; Plasma applications; Plasma measurements; Plasma properties; Real time systems; Semiconductor device modeling; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on

Conference_Location

San Jose, CA

Print_ISBN

0-7803-9143-8

Type

conf

DOI

10.1109/ISSM.2005.1513315

Filename

1513315