Title :
A multivariate statistical analysis of tool parameters to improve an erase failure of a flash memory device
Author :
Miwa, Kazuhiro ; Watanabe, Kazuhiro ; Takeishi, Kumiko ; Kobayashi, Toru ; Imaoka, Kazunori
Author_Institution :
Spansion LLC, Fukushima
Abstract :
A multivariate statistical analysis of tool parameters in a stack gate etching was performed to identify variables relating to an erase failure of a flash memory device. A statistical modeling of the extracted parameters was also done to predict (simulate) yields in an erase test. One of extracted parameters was controlled experimentally to improve the erase failure based on the analysis. In the result we found a possibility to improve the erase yield by controlling a tool parameter in the etching process
Keywords :
etching; flash memories; integrated circuit testing; statistical analysis; erase failure; erase test; flash memory device; multivariate statistical analysis; stack gate etching; statistical modeling; tool parameters; Etching; Failure analysis; Flash memory; Nonvolatile memory; Predictive models; Production; Radio frequency; Statistical analysis; Testing; Voltage;
Conference_Titel :
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9143-8
DOI :
10.1109/ISSM.2005.1513316